Influence du vacuomètre et de la chambre d'absorption sur les gaz résiduels d'un cryoréservoir sous vide poussé et doté de plusieurs couches d'isolation.
Influence of vacuum gauge and baking of adsorption chamber on the residual gases of the HVMLI cryogenic tank.
Résumé
The high-vacuum-multilayer-insulation (HVMLI) cryogenic tank has been widely used in industry because of the excellent thermal insulation performance. Its thermal insulation performance can only be obtained at high vacuum conditions. The limit of the present day’s vacuum technology is closely related to the residual gases analysis and control. The spectrums of the residual gases in the HVMLI cryogenic tank at various conditions were obtained by using RGA. The influence of the cold cathode vacuum gauge on the residual gases is negligible. A series of influences of hot cathode vacuum gauge on the residual gases were observed. There are the chemical reaction between the hot cathode and the residual gases. The cation, anion and neutral ion are emitted from the hot cathode. The adsorbed gases on the electrode and metals are desorbed due to the heat radiation of the cathode. The hot cathode vacuum gauge should be installed as far as practicable from the RGA. The variation of pressure-time in the HVMLI cryogenic tank accords with the parabola relation during baking of adsorption chamber. The variation of total pressure is corresponding to that of the partial pressures of residual gases. The changing process of the partial pressures of the residual gases was analyzed thoroughly. The thermal insulation performance of the HVMLI cryogenic tank is improved due to baking of adsorption chamber. The experimental results and related analysis may be adopted in the design of the cryogenic tank.
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Détails
- Titre original : Influence of vacuum gauge and baking of adsorption chamber on the residual gases of the HVMLI cryogenic tank.
- Identifiant de la fiche : 30005472
- Langues : Anglais
- Source : ACRA2010. Asian conference on refrigeration and air conditioning: Tokyo, Japan, June 7-9, 2010.
- Date d'édition : 07/06/2010
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