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Une étude numérique sur un réfrigérateur à diffusion à absorption fonctionnant grâce à un frigorigène binaire, pour des applications à basse température.

A numerical investigation of a diffusion absorption refrigerator operating with the binary refrigerant for low temperature applications.

Auteurs : WANG Q., GONG L., WANG J. P., et al.

Type d'article : Article

Résumé

This paper investigated a diffusion absorption refrigerator (DAR) operating with the binary refrigerant R23/R134a, the absorbent DMF and auxiliary inert gas helium. The results show that the coefficient of performance (COP) is mainly determined by the following parameters at the specified generating temperature, ambient temperature and heat source temperature: system pressure, composition of the rich solution, rectifying effect of the rectifier and ratio of helium to the mixed refrigerant. The optimum system pressure corresponding to the maximum COP achieves when the heat capacity rates of the hot and cold working fluids reach an overall match in the refrigerant recuporator at the specified composition of rich solution, rectifying effect of the rectifier and ratio of helium to the mixed refrigerant. The factors that influence COP are investigated in detail, which include the above parameters as well as the generating temperature (110-160 °C), ambient temperature (10-28 °C) and heat source temperature (-15 to -45 °C). The application of binary refrigerant in the DAR can provide a new way to obtain the refrigerating temperature level of -40 °C using low-grade thermal energy, which is very promising to low temperature applications where the electricity is shorted. [Reprinted with permission from Elsevier. Copyright, 2011].

Détails

  • Titre original : A numerical investigation of a diffusion absorption refrigerator operating with the binary refrigerant for low temperature applications.
  • Identifiant de la fiche : 30004009
  • Langues : Anglais
  • Source : Applied Thermal Engineering - vol. 31 - n. 10
  • Date d'édition : 07/2011
  • DOI : http://dx.doi.org/10.1016/j.applthermaleng.2011.02.021

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