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Salles blanches : développement de technologies de contrôle pour les contaminants chimiques dans l'air.

[In Japanese. / En japonais.]

Auteurs : KOBAYASHI S., KOBAYASHI T., SHIGIHARA S., et al.

Type d'article : Article

Résumé

Along with the increasing integration degree of semiconductor devices, the control of airborne chemical contamination and airborne particles in clean rooms has become necessary. Chemical filters have been employed for this purpose. However, the award-winning clean room described here was required to achieve reduced amounts of chemical contaminants without using chemical filters. To fulfill the requirement, clean materials for the clean room were analytically selected, or newly developed. Using these clean materials, a large-scale clean room for the evaluation of processing machines for 300 mm wafer was constructed: it was the first in the world. The airborne contaminants in the clean room were found to be satisfactorily low.

Détails

  • Titre original : [In Japanese. / En japonais.]
  • Identifiant de la fiche : 2002-0475
  • Langues : Japonais
  • Source : SHASE - vol. 74 - n. 11
  • Date d'édition : 11/2000
  • Document disponible en consultation à la bibliothèque du siège de l'IIF uniquement.

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