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Development of control technologies for chemical contaminants in clean room air.

[In Japanese. / En japonais.]

Author(s) : KOBAYASHI S., KOBAYASHI T., SHIGIHARA S., et al.

Type of article: Article

Summary

Along with the increasing integration degree of semiconductor devices, the control of airborne chemical contamination and airborne particles in clean rooms has become necessary. Chemical filters have been employed for this purpose. However, the award-winning clean room described here was required to achieve reduced amounts of chemical contaminants without using chemical filters. To fulfill the requirement, clean materials for the clean room were analytically selected, or newly developed. Using these clean materials, a large-scale clean room for the evaluation of processing machines for 300 mm wafer was constructed: it was the first in the world. The airborne contaminants in the clean room were found to be satisfactorily low.

Details

  • Original title: [In Japanese. / En japonais.]
  • Record ID : 2002-0475
  • Languages: Japanese
  • Source: SHASE - vol. 74 - n. 11
  • Publication date: 2000/11
  • Document available for consultation in the library of the IIR headquarters only.

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