A high-flux atomic oxygen source for the deposition of high-critical temperature superconducting films.

Author(s) : YU-JAHNES L. S., BROGAN W. T., ANDERSON A. C., CIMA M. J.

Type of article: Article

Details

  • Original title: A high-flux atomic oxygen source for the deposition of high-critical temperature superconducting films.
  • Record ID : 1993-3170
  • Languages: English
  • Source: Rev. sci. Instrum. - vol. 63 - n. 9
  • Publication date: 1992/09
  • Document available for consultation in the library of the IIR headquarters only.

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