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ONE-PUMPDOWN-FABRICATED NIOBIUM-SILICON-SILICON DIOXIDE-NIOBIUM JOSEPHSON TUNNEL JUNCTIONS.

Author(s) : YOUBAO L.

Summary

THE AUTHORS DESCRIBE A NEW PROCESS OF ONE PUMPDOWN OF A NIOBIUM-SILICIUM-SILICIUM OXIDE-NIOBIUM JOSEPHSON TUNNEL JUNCTION. THIS IS A DOUBLE-LAYER-OVERHANG WINDOW STRUCTURE. THESE JUNCTIONS ARE RELIABLE DUE TO THEIR PERFECT TIGHTNESS AND THE ABSENCE OF DETERIORATION AND CONTAMINATION. SUCH A JUNCTION, SUBJECTED TO 30 CYCLES BETWEEN THE AMBIENT TEMPERATURE AND 77 K OR TO 8 CYCLES BETWEEN THE AMBIENT AND 4.2 K, IMMERSED 30 MIN IN BOILING WATER, SHOWS NO SIGNIFICANT DETERIORATION. HIGHER VACUUM AND NIOBIUM OF HIGHER PURITY WOULD PROVIDE A JUNCTION WITH BETTER CHARACTERISTICS.

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Pages: 297-301

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Details

  • Original title: ONE-PUMPDOWN-FABRICATED NIOBIUM-SILICON-SILICON DIOXIDE-NIOBIUM JOSEPHSON TUNNEL JUNCTIONS.
  • Record ID : 1985-0934
  • Languages: English
  • Source: [Refrigeration serving humanity]. Proceedings of the XVIth international Congress of Refrigeration.
  • Publication date: 1983/08/07
  • Document available for consultation in the library of the IIR headquarters only.

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