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Resistive and diamagnetic transition at 250 K in a cuprate film deposited atomic layer by atomic layer.

Transition résistive et diamagnétique à 250 K dans un film de cuprate déposé couche atomique par couche atomique.

Author(s) : LAGUES M., XIE X. M., TEBBJI H., XU X. Z., MAIRET V., HATTERER C., BEURAN C. F., DEVILLE-CAVELLIN C.

Type of article: Article

Summary

The lamellar structure of superconducting cuprates in principle allows them to be deposited by sequentially imposed layer epitaxy. The authors describe the properties of a film of artificial cuprate compound deposited by this technique. This compound belonging to the BSCCO family presents a resistivity drop of more than four orders of magnitude below 250 K. A diamagnetic transition is observed below 290 K by measurement of the alternating-current susceptibility, and by measurement of the magnetization although the measured value is close to the sensitivity limit. Additional observed features like the strong non-linearity of the voltage-current characteristics and a diamagnetic hysteresis allow to propose the superconductivity at 250 K, as a plausible explanation of the properties of this compound.

Details

  • Original title: Transition résistive et diamagnétique à 250 K dans un film de cuprate déposé couche atomique par couche atomique.
  • Record ID : 1994-3371
  • Languages: French
  • Source: C. R. Acad. Sci., Sér. II - vol. 318 - n. 5
  • Publication date: 1994/03/03
  • Document available for consultation in the library of the IIR headquarters only.

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