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PREPARATION OF SUPERCONDUCTING FILMS OF YBCO BY DIRECT-CURRENT MAGNETRON SPUTTERING AT HIGH GAS PRESSURE.

[In Japanese. / En japonais.]

Author(s) : UCHIYAMA T., SUZUKI M., TAKAHASHI K.

Type of article: Article

Summary

WITH DIRECT CURRENT MAGNETRON SPUTTERING USING SINGLE SINTERED TARGETS WITH DIFFERENT COMPOSITIONS, FILMS WERE DEPOSITED ONTO HEATED SUBSTRATES OF SINGLE CRYSTAL MAGNESIUM OXIDE AND WERE HEAT-TREATED AT 723-823 K (450-550 DEG C) FOR 30 MINUTES IN AN OXYGEN PRESSURE OF 21.3 KILOPASCALS DURING THE COURSE OF COOLING. THE FILM THICKNESS RANGES FROM 10 TO 600 NANOMETERS. THE RATE OF DEPOSITION FOR YBCO FILMS DEPENDS GREATLY ON THE OXYGEN PARTIAL PRESSURE AND TOTAL GAS PRESSUE P. A SMALL INCREASE IN OXYGEN PARTIAL PRESSURE FROM 0.013 TO 1.3 PASCALANOMALOUSLY REDUCES THE DEPOSITION RATE. IN THE CASE OF P = 40 PASCALS, THE DEPOSITION RATE BECOMES CONSTANT.

Details

  • Original title: [In Japanese. / En japonais.]
  • Record ID : 1991-2418
  • Languages: Japanese
  • Source: Cryogenics/ Cryog. Eng. - vol. 25 - n. 5
  • Publication date: 1990
  • Document available for consultation in the library of the IIR headquarters only.

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