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Removal of superfluid helium films from surfaces below 0.1 K.

Author(s) : TORII R., BANDLER S. R., MORE T., et al.

Type of article: Article

Summary

The authors have constructed an apparatus that is able to maintain a helium-free surface at low temperature (T not higher than 0.1 K) in a cell containing superfluid helium. They discuss the considerations involved in the design of this device, and describe tests that they have made to confirm that a film-free surface has been produced.

Details

  • Original title: Removal of superfluid helium films from surfaces below 0.1 K.
  • Record ID : 1993-1207
  • Languages: English
  • Source: Rev. sci. Instrum. - vol. 63 - n. 1
  • Publication date: 1992/01
  • Document available for consultation in the library of the IIR headquarters only.

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