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Adsorption low-temperature cleaning of krypton from tetrafluoromethane impurities.

[In Russian. / En russe.]

Author(s) : ARHAROV A. M., SAVINOV M. Û., BONDARENKO V. L., et al.

Type of article: Article

Summary

In the separation process of a krypton-xenon mixture into pure products on an industrial installation of the rectification type, a so-called "fraction of dirty krypton" is obtained, where practically all the tetrafluoromethane being in the mixture to be treated, is concentrated. An adsorption method of low-temperature cleaning of this fraction from tetrafluoromethane is proposed and the main results of the calculation of the cleaning assembly are presented.

Details

  • Original title: [In Russian. / En russe.]
  • Record ID : 2006-0517
  • Languages: Russian
  • Source: Kholodilnaya Tekhnika - n. 10
  • Publication date: 2005

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