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Application of diffuse mismatch theory to the prediction of thermal boundary resistance in thin-film high-critical temperature superconductors.

Author(s) : PHELAN P. E.

Type of article: Article

Summary

Thermal boundary resistance plays and important role in the design and performance of thin-film high-temperature superconducting devices, such as infrared detectors and optical switches. Here, the Diffuse Mismatch Model which considers that all phonons reaching the interface between the film and substrate scatter diffusely, is applied to the calculation of boundary resistance.

Details

  • Original title: Application of diffuse mismatch theory to the prediction of thermal boundary resistance in thin-film high-critical temperature superconductors.
  • Record ID : 1999-1372
  • Languages: English
  • Source: J. Heat Transf. - vol. 120 - n. 1
  • Publication date: 1998/02
  • Document available for consultation in the library of the IIR headquarters only.

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