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DUST IN CLEAN ROOMS.

Author(s) : ZHAO R. Y., QIAN P. N., XU W. Q.

Summary

A CLOSE ATTENTION HAS BEEN PAID TO DUST CONTAMINATION IN CLEAN ROOMS FOR DEVELOPING SEMICONDUCTOR INDUSTRY AND HIGH-TECH SINCE 1960S. WITH INCREASING THE PRODUCT QUALITY AND RELIABILITY, DUST CONTAMINATION THAT CAN CAUSE DAMAGE OR BREAKDOWN IN ELEMENTS AND ASSEMBLIES OF PRODUCTS MUST BE CAREFULLY CONTROLLED. THEREFORE CLASS 1 AND CLASS 10 HAVE BEEN ADDED IN NEW PUBLISHED FEDERAL STANDARD 209D AND THE PARTICLE DIAMETER IS EXTENDED TO 0. 1 MICROMETER.

Details

  • Original title: DUST IN CLEAN ROOMS.
  • Record ID : 1990-2072
  • Languages: English
  • Publication date: 1989/08/01
  • Source: Source: CLIMA 2000, Sarajevo
    vol. 3; 152-156; 1 fig.; 4 ref.
  • Document available for consultation in the library of the IIR headquarters only.

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