Montreal Protocol on substances that deplete the ozone layer. 1994 Report of the Solvents, Coatings and Adhesives Technical Options Committee. 1995 Assessment.

Author(s) : ONU Environnement (ex-PNUE), ANDERSEN S. O.

Type of monograph: Report

Summary

Extract of contents: introduction; electronics industry applications; precision, metal, and dry cleaning applications (R113 and methyl chloroform use and alternatives for reducing or replacing them; cost of alternatives, environmental, energy, health and safety considerations); adhesive applications; coatings and inks applications; aerosols applications; other solvent uses of R113 and methyl chloroform (semiconductor manufacturing); alternatives to ozone-depleting solvents in developing countries; 22 case studies of phaseout activities.

Details

Original title: Montreal Protocol on substances that deplete the ozone layer. 1994 Report of the Solvents, Coatings and Adhesives Technical Options Committee. 1995 Assessment.
Record ID : 1995-1993
Languages: English
Subject: Figures, economy, Regulation, Developing country
Publication: Unep (united nations environment programme) - Kenya/Kenya
Publication date: 1994/11
Source: Source: 395 p. (21 x 29.7); fig.; tabl.; append.
Document available for consultation in the library of the IIR headquarters only.

Indexing

Themes: CFCs;
Regulations and standardization (Montreal and Kyoto Protocols…);
Refrigerants, secondary refrigerants: regulations and standards;
Refrigerants, secondary refrigerants: economics and statistics
Keywords: Solvent; Regulations; Semiconductor; Safety; Electronics; Aerosol; R113; Substitute; Drying; Developing country; World; Ozone depletion