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Thin-film Pulsed Laser-assisted Deposition (PLD): principles and industrial perspectives.

Dépôt de films minces par ablation laser : principe et perspectives industrielles.

Author(s) : BELOUET C.

Type of article: Article

Summary

The PLD technique has emerged as a most promising thin film deposition technique, especially in the case of oxide compounds with a complex formulation. The different features of the technique, its advantages and drawbacks, are presented in succession. The several solutions to the problem of droplet ejection, inherently bound to this process, are briefly reviewed. Finally, the last section is concerned with the potential niches of this technique in the industrial environment.

Details

  • Original title: Dépôt de films minces par ablation laser : principe et perspectives industrielles.
  • Record ID : 2000-0023
  • Languages: French
  • Source: Vide - vol. 54 - n. 288
  • Publication date: 1998
  • Document available for consultation in the library of the IIR headquarters only.

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