IIR document

Cryogenic processes for ultra high purity gases.

Author(s) : HA B.


An overview of current cryogenic processes/production techniques for ultra high purity gases is presented covering mainly nitrogen and oxygen. Various cryogenic process schemes will be shown for nitrogen generation plants. Concepts of dedicated high purity oxygen plant versus the integrated approach will be discussed. The removal of traces of impurities by cryogenic distillation, front end catalytic process or downstream purifiers will also reviewed along with reliability and technical/economic issues associated with the back up system. Latest development on liquid phase purifier with its applications in ultra high purity gases plants will also be focused. Trends and future requirement of semiconductor industry and the resulting challenges or impact on the production techniques will be examined along with the limitations of analytical equipment.

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Format PDF

Pages: 13-24


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  • Original title: Cryogenic processes for ultra high purity gases.
  • Record ID : 1998-0045
  • Languages: English
  • Source: MUST 1996. Meeting on Air Separation Technology
  • Publication date: 1996/10/10


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