Matching the resistivity of silicon-niobium thin film thermometers to the experimental temperature range.

Author(s) : VECCHIO D. de, TABOREK P., RUTLEDGE J. E.

Type of article: Article

Summary

The useful temperature range of semiconducting resistive thermometers is limited by declining sensitivity at high temperature and inconveniently high resistivity at low temperatures. The useful temperature range of sputtered thin film silicon-niobium resistance thermometers is controlled by the niobium concentration. The authors have developed a simple technique for controlling the niobium concentration during the fabrication process. They describe an extremely sensitive family of thermometers with useful temperature ranges that overlap and span temperatures from below 1 K to above 450 K.

Details

Original title: Matching the resistivity of silicon-niobium thin film thermometers to the experimental temperature range.
Record ID : 1996-2740
Languages: English
Source: Rev. sci. Instrum. - vol. 66 - n. 11
Publication date: 1995/11
Document available for consultation in the library of the IIR headquarters only.

Links

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Indexing

Themes: Thermodynamic measurements
Keywords: Thermometer; Measurement; Thermometry; Electrical resistance; Silicon; Niobium; Film