
Summary
The gas purity specification for micro-electronic industries applications are constantly increasing. From 1 ppm twenty years ago, it is now going down to less than 1 ppb for each component. The usual cryogenic purifiers have shown their limits. A new process including the purification of helium in liquid phase during its transfer from a 1100 US ISO container to a dedicated ultra clean vessel has shown its ability to reach these high quality specifications.
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Pages: 2004-1
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Details
- Original title: Transfer and delivery of ultra pure helium.
- Record ID : 2005-1596
- Languages: English
- Source: Cryogenics 2004. Proceedings of the 8th Cryogenics Conference
- Publication date: 2004/04/27
Links
See other articles from the proceedings (27)
See the conference proceedings
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Cryogenic processes for ultra high purity gases.
- Author(s) : HA B.
- Date : 1996/10/10
- Languages : English
- Source: MUST 1996. Meeting on Air Separation Technology
- Formats : PDF
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New Ne-He purification plant: theoretical and e...
- Author(s) : ARKHAROV I. A., BONDARENKO V. L., KOSOVA A. V., et al.
- Date : 2002/04/23
- Languages : English
- Source: Cryogenics 2002. Proceedings of the 7th Cryogenics Conference
- Formats : PDF
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Design and optimization of coil finned-tube hea...
- Author(s) : GUPTA P. K., KUSH P. K., TIWARI A.
- Date : 2007/05
- Languages : English
- Source: Cryogenics - vol. 47 - n. 5-6
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Development of a vacuum leak test method for la...
- Author(s) : KAWANO K., HAMADA K., OKUNO K., et al.
- Date : 2006
- Languages : Japanese
- Source: Journal of the Cryogenic Society of Japan - vol. 41 - n. 3
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Essais cryogéniques du cryostat de capture de TTF.
- Author(s) : BUHLER S.
- Date : 1997/04/02
- Languages : French
- Source: Cinquièmes Journées de cryogénie et de supraconductivité. Recueil des conférences et posters.
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