Summary
The gas purity specification for micro-electronic industries applications are constantly increasing. From 1 ppm twenty years ago, it is now going down to less than 1 ppb for each component. The usual cryogenic purifiers have shown their limits. A new process including the purification of helium in liquid phase during its transfer from a 1100 US ISO container to a dedicated ultra clean vessel has shown its ability to reach these high quality specifications.
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Pages: 2004-1
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Details
- Original title: Transfer and delivery of ultra pure helium.
- Record ID : 2005-1596
- Languages: English
- Source: Cryogenics 2004. Proceedings of the 8th Cryogenics Conference
- Publication date: 2004/04/27
Links
See other articles from the proceedings (27)
See the conference proceedings
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The Ras Laffan helium purification unit.
- Author(s) : ANDRIEU F., TSEVERY J. M., SCHMITT N., et al.
- Date : 2006/07/17
- Languages : English
- Source: Multiconference CryoPrague 2006 (9th Cryogenics 2006, ICEC 21, ICMC'06)
- Formats : PDF
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New Ne-He purification plant: theoretical and e...
- Author(s) : ARKHAROV I. A., BONDARENKO V. L., KOSOVA A. V., et al.
- Date : 2002/04/23
- Languages : English
- Source: Cryogenics 2002. Proceedings of the 7th Cryogenics Conference
- Formats : PDF
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Prepurification unit (PPU) process for the prod...
- Author(s) : JAIN R., ACHARYA D.
- Date : 1996/10/10
- Languages : English
- Source: MUST 1996. Meeting on Air Separation Technology
- Formats : PDF
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Cryogenic processes for ultra high purity gases.
- Author(s) : HA B.
- Date : 1996/10/10
- Languages : English
- Source: MUST 1996. Meeting on Air Separation Technology
- Formats : PDF
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Production of ultrahigh purity nitrogen free of...
- Author(s) : AGRAWAL R.
- Date : 1996/10/10
- Languages : English
- Source: MUST 1996. Meeting on Air Separation Technology
- Formats : PDF
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