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Fabrication and investigation of TBCCO thin film SQUIDS.

Author(s) : ZENG S. H., WANG S. G., LI J. Z., et al.

Type of article: Article

Summary

The thin film was prepared by direct current magnetron sputtering with post annealing. Chemical wet etching technique was employed to pattern the direct current SQUID. The critical current of the SQUID was optimized through an ion beam thinning process, in which the degradation of critical temperature was negligible. These devices demonstrated quantum interference effect at 77 K, and the average noise power was 1.7 E(-26) J/hertz within direct current and 1 hertz.

Details

  • Original title: Fabrication and investigation of TBCCO thin film SQUIDS.
  • Record ID : 1993-0056
  • Languages: English
  • Source: Cryogenics - vol. 30
  • Publication date: 1990/09

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