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Internal equilibrium of temperature in large devices.

[In German. / En allemand.]

Author(s) : SCHNEIDER H., et al.

Type of article: Article

Summary

The objective of this work was to reduce the area of clean rooms for photolithographical equipment, by developing an internal control of temperatures in the machines themselves. This principle has been applied for 5 years for the production of silicon wafers used in the manufacturing of electronic chips. A simulation programme makes it possible to monitor the fluctuations of body and air temperatures, with a PID algorithm (Proportional Integral Differential), under variable conditions of ambient temperature, internal heat source, etc.

Details

  • Original title: [In German. / En allemand.]
  • Record ID : 1993-0422
  • Languages: German
  • Source: Klima Kälte Heiz. - vol. 19 - n. 12
  • Publication date: 1991/12
  • Document available for consultation in the library of the IIR headquarters only.

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