Internal equilibrium of temperature in large devices.
[In German. / En allemand.]
Author(s) : SCHNEIDER H., et al.
Type of article: Article
Summary
The objective of this work was to reduce the area of clean rooms for photolithographical equipment, by developing an internal control of temperatures in the machines themselves. This principle has been applied for 5 years for the production of silicon wafers used in the manufacturing of electronic chips. A simulation programme makes it possible to monitor the fluctuations of body and air temperatures, with a PID algorithm (Proportional Integral Differential), under variable conditions of ambient temperature, internal heat source, etc.
Details
- Original title: [In German. / En allemand.]
- Record ID : 1993-0422
- Languages: German
- Source: Klima Kälte Heiz. - vol. 19 - n. 12
- Publication date: 1991/12
- Document available for consultation in the library of the IIR headquarters only.
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Energy-efficiency strategies for clean rooms wi...
- Author(s) : TSCHUDI W., FAULKNER D., HEBERT A.
- Date : 2005
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- Source: ASHRAE Transactions. 2005 Annual Meeting, Denver, Colorado, USA. Volume 111, part 2 + CD-ROM.
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Exact control of temperature and humidity.
- Author(s) : BEEK P. van
- Date : 1992/02
- Languages : Dutch
- Source: Koude & Luchtbehandeling - vol. 85 - n. 2
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CLEAN ROOM SERVICES.
- Author(s) : TRENGOVE D. R. D.
- Date : 1989/06
- Languages : English
- Source: J. chart. Inst. Build. Serv. - vol. 11 - n. 6
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Le cas particulier des salles blanches.
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- Date : 1996/06/27
- Languages : French
- Source: Le conditionnement d'ambiance en industrie agroalimentaire.
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TEMPERATURE AND HUMIDITY CONTROL FOR ELECTRONIC...
- Author(s) : HAINES R. W.
- Date : 1984/11
- Languages : English
- Source: Heat. Pip. Air Cond. - vol. 56 - n. 11
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