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TEMPERATURE STAGE FOR ULTRALOW TEMPERATURE OXYGEN PLASMA ASHING.

Author(s) : BERNIUS M. T., BRENNA J. T., MORRISON G. H.

Type of article: Article

Summary

THIS PAPER DESCRIBES AN APPARATUS THAT ALLOWS THE DECOMPOSITION OF ORGANIC MATERIALS BY A RADIO FREQUENCY EXCITED OXYGEN PLASMA AFTERGLOW AT TEMPERATURES AS LOW AS 203 K (-70 DEG C) PRIOR TO ANALYTICAL STUDY. THE USEFULNESS OF THIS TECHNIQUE IS DEMONSTRATED BY THE FREEZE-DRYING AND ASHING OF FROZEN-HYDRATED BIOLOGICAL SAMPLES. SUBSEQUENT ANALYSIS INDICATES THAT THE CELL MORPHOLOGY SEEN IN TWO DIMENSIONS REMAINS INTACT AFTER SUCH TREATMENT.

Details

  • Original title: TEMPERATURE STAGE FOR ULTRALOW TEMPERATURE OXYGEN PLASMA ASHING.
  • Record ID : 1986-1309
  • Languages: English
  • Source: Rev. sci. Instrum. - vol. 56 - n. 11
  • Publication date: 1985
  • Document available for consultation in the library of the IIR headquarters only.

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