Application of a 3C duct design method in semiconductor factory process exhaust systems.
Author(s) : CHEN W. L., TING C. C., SHIU H. R., et al.
Summary
The paper presents a method of calculation for ducts which are used to evacuate special gases and chemicals involved in semiconductor refrigeration processes. These products are more and more harmful to human health and the exhaust duct system must be carefully designed.
Details
- Original title: Application of a 3C duct design method in semiconductor factory process exhaust systems.
- Record ID : 2003-0461
- Languages: English
- Source: ASHRAE Transactions. 2002 Winter Meeting, Atlantic City, New Jersey. Volume 108, part 1 + CD-ROM.
- Publication date: 2002
- Document available for consultation in the library of the IIR headquarters only.
Links
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Indexing
- Themes: Other industrial applications
- Keywords: Gas; Semiconductor; Manufacture; Ventilation; Design; Cooling; Chemical; Process; Duct
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