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CO2 LASER ANNEALING OF PLASMA-DEPOSITED HIGH-TRANSITION TEMPERATURE SUPERCONDUCTING THICK FILMS.

Author(s) : VARSHNEY U.

Type of article: Article

Summary

THE STUDY EVALUATES LASER ANNEALING TECHNIQUES FOR PLASMA-DEPO SITED YBACUO THICK FILMS USING A HIGH-ENERGY CO2 LASER (10.6 MICROMETERS) IN A CONTINUOUS WAVE MODE. THE RESULTS ARE COMPARED WITH THOSE OBTAINED BY CONVENTIONAL FURNACE ANNEALING TECHNIQUES NECESSARY FOR POST-HEAT TREATMENT OF AS-DEPOSITED SUPERCONDUCTING THICK FILMS. THE HIGH-TRANSITION TEMPERATURE SUPERCONDUCTING PHASE IS RECOVERED BY CATIONIC DIFFUSION DURING SUBSEQUENT POST-ANNEALING HEAT TREATMENT. THE SIGNIFICANCE OF THE TECHNOLOGY LIES IN THE ELIMINATION OF FILM/SUBSTRATE INTERDIFFUSION PROBLEMS, THEREBY RESULTING IN HIGH-QUALITY SUPERCONDUCTING THICK FILMS.

Details

  • Original title: CO2 LASER ANNEALING OF PLASMA-DEPOSITED HIGH-TRANSITION TEMPERATURE SUPERCONDUCTING THICK FILMS.
  • Record ID : 1990-0475
  • Languages: English
  • Source: J. Supercond. - vol. 2 - n. 2
  • Publication date: 1989/06
  • Document available for consultation in the library of the IIR headquarters only.

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